Advances in Nano Research

Volume 10, Number 1, 2021, pages 91-99

DOI: 10.12989/anr.2021.10.1.091

Device modelling and performance analysis of two-dimensional AlSi3 ballistic nanotransistor

M.W. Chuan , K.L. Wong , A. Hamzah , S. Rusli , N.E. Alias , C.S. Lim , M.L.P. Tan

Abstract

Silicene is an emerging two-dimensional (2D) semiconductor material which has been envisaged to be compatible with conventional silicon technology. This paper presents a theoretical study of uniformly doped silicene with aluminium (AlSi<sub>3</sub>) Field-Effect Transistor (FET) along with the benchmark of device performance metrics with other 2D materials. The simulations are carried out by employing nearest neighbour tight-binding approach and top-of-the-barrier ballistic nanotransistor model. Further investigations on the effects of the operating temperature and oxide thickness to the device performance metrics of AlSi<sub>3</sub> FET are also discussed. The simulation results demonstrate that the proposed AlSi<sub>3</sub> FET can achieve on-to-off current ratio up to the order of seven and subthreshold swing of 67.6 mV/dec within the ballistic performance limit at room temperature. The simulation results of AlSi<sub>3</sub> FET are benchmarked with FETs based on other competitive 2D materials such as silicene, graphene, phosphorene and molybdenum disulphide.

Key Words

doped silicene; ballistic transport; 2D material; I-V characteristics; nanotransistor

Address

(1) M.W. Chuan, K.L. Wong, A. Hamzah, S. Rusli, N.E. Alias, C.S. Lim and M.L.P. Tan: School of Electrical Engineering, Faculty of Engineering, Universiti Teknologi Malaysia, 81310 Skudai, Johor, Malaysia

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